Influência da adição de zircônio na dureza e resistência à oxidação em altas temperaturas de revestimentos de Ta1-xZrxN depositados por magnetron sputtering reativo

Abstract

In this work was studied Ta1-xZrxN thin films aiming to investigate the influence of zirconium addition on the microstructure, hardness and high temperature oxidation resistance of the coatings. The thin films were deposited by reactive magnetron sputtering and characterized by Grazing Incidence X-ray Diffraction (GIXRD), Energy Dispersive Spectroscopy (EDS), nanohardness analysis and oxidation tests at high temperatures. It was first necessary to define the deposition parameters of TaN thin films with that had the amorphous structure. From this, Ta1-xZrxN thin films were deposited with different concentrations of Zr: 26, 52 e 77 at.%. GAXRD showed that all Ta1-xZrxN thin films maintained ZrN crystalline structure, forming a TaZrN solid solution. Zr incorporation did not alter hardness values of Ta1-xZrxN coatings, however, promoted significant improvements in the oxidation resistance when compared to pure TaN thin films.