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Use este identificador para citar ou linkar para este item: https://ri.ufs.br/jspui/handle/riufs/25075
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dc.contributor.authorFreitas, Flávio Gustavo Ribeiro-
dc.contributor.authorHübler, Roberto-
dc.contributor.authorSoares, Gabriel-
dc.contributor.authorConceição, Amanda Gardênia Santos-
dc.contributor.authorVitória, Edson Reis-
dc.contributor.authorCarvalho, Renata Gomes-
dc.contributor.authorTentardini, Eduardo Kirinus-
dc.date.accessioned2026-07-06T18:16:07Z-
dc.date.available2026-07-06T18:16:07Z-
dc.date.issued2015-
dc.identifier.citationFREITAS, F. G. R. et al. Structural and mechanical properties of Zr-Si-N thin films prepared by reactive magnetron sputtering. Materials Research, São Carlos, v. 18, n. 2, p. 30–34, 2015. Disponível em: https://www.scielo.br/j/mr/a/WmnvWtzfrqTX3kxsVjkzFhF/?lang=en. Acesso em: 7 abr. 2026.pt_BR
dc.identifier.issn1980-5373-
dc.identifier.urihttps://ri.ufs.br/jspui/handle/riufs/25075-
dc.languageengpt_BR
dc.publisherAssociação Brasileira de Metalurgia, Materiais e Mineração (ABM) / Associação Brasileira de Cerâmica (ABC) / Associação Brasileira de Polímeros (ABPol)pt_BR
dc.relation.ispartofMaterials Researchpt_BR
dc.subjectThin filmseng
dc.subjectZrSiNeng
dc.subjectMagnetron sputteringeng
dc.subjectNanohardnesseng
dc.subjectRBSeng
dc.titleStructural and mechanical properties of Zr-Si-N thin films prepared by reactive magnetron sputteringpt_BR
dc.typeArtigopt_BR
dc.identifier.licenseCreative Commons Atribuição 4.0 Internacional (CC BY 4.0)pt_BR
dc.description.resumoZirconium silicon nitride (ZrSiN) thin films were deposited by reactive magnetron sputtering in order to verify the silicon influence on coating morphology and mechanical properties. The Si/(Zr+Si) ratio was adjusted between 0 to 15% just modifying the power applied on the silicon target. Only peaks associated to ZrN crystalline structure were observed in XRD analysis, since Si3 N4 phase was amorphous. All samples have (111) preferred orientation, but there is a peak intensity reduction and a broadening increase for the sample with the highest Si/(Zr+Si) ratio (15%), demonstrating a considerable loss of crystallinity or grain size reduction (about 8 nm calculated by Scherrer). It was also observed that the I(200)/I(111) ratio increases with silicon addition. Chemical composition and thickness of the coatings were determined by RBS analysis. No significant changes in nanohardness with increasing Si content were found. The morphology observed by FEG-SEM presents non columnar characteristics for thin films with silicon addition. The set of results suggests that Si addition is restricting the columnar growth of ZrN thin films. This conclusion is justified by the fact that Si contributes to increase the ZrN grains nucleation during the sputtering process.pt_BR
dc.description.localSão Carlospt_BR
dc.identifier.doihttps://doi.org/10.1590/1516-1439.336214-
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