Use este identificador para citar ou linkar para este item: https://ri.ufs.br/jspui/handle/riufs/25548
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dc.contributor.authorMelo, Adolfo Henrique Nunes-
dc.contributor.authorMacêdo, Marcelo Andrade-
dc.date.accessioned2026-07-14T20:39:17Z-
dc.date.available2026-07-14T20:39:17Z-
dc.date.issued2016-
dc.identifier.citationMELO, A. H. N.; MACEDO, M. A. Permanent data storage in ZnO thin films by filamentary resistive switching. PloS One, San Francisco, v. 11, n. 12, 2016. Disponível em: https://journals.plos.org/plosone/article?id=10.1371/journal.pone.0168515. Acesso em: 14 jul. 2026.pt_BR
dc.identifier.issn1932-6203-
dc.identifier.urihttps://ri.ufs.br/jspui/handle/riufs/25548-
dc.languageengpt_BR
dc.publisherPublic Library of Sciencept_BR
dc.relation.ispartofPloS Onept_BR
dc.subjectResistive random access memorieseng
dc.subjectNonrewritable resistive memorieseng
dc.subjectHigh resistance stateeng
dc.subjectZnO thin filmseng
dc.titlePermanent data storage in ZnO thin films by filamentary resistive switchingpt_BR
dc.typeArtigopt_BR
dc.identifier.licenseCreative Commons Atribuição 4.0 Internacional (CC BY 4.0)pt_BR
dc.description.resumoResistive memories are considered the most promising candidates for the next generation of non-volatile memory; however, attention has so far been limited to rewritable memory features for applications in resistive random access memories (RRAM). In this article, we provide a new insight into the applicability of resistive memories. The characteristics of nonrewritable resistive memories (NRRM) were investigated. Devices with Pt/ZnO/ITO architecture were prepared using magnetron sputtering, upon which various bipolar and unipolar resistive switching tests were performed. The results showed excellent distinction between the high resistance state (HRS) and low resistance state (LRS), with RHRS/RLRS = 5.2 × 1011 for the Pt/ZnO/ITO device with deposition time of 1 h. All samples were stable for more than 104 s, indicating that the devices have excellent applicability in NRRMs.pt_BR
dc.description.localSan Franciscopt_BR
dc.identifier.doihttps://doi.org/10.1371/journal.pone.0168515-
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