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https://ri.ufs.br/jspui/handle/riufs/25548Registro completo de metadados
| Campo DC | Valor | Idioma |
|---|---|---|
| dc.contributor.author | Melo, Adolfo Henrique Nunes | - |
| dc.contributor.author | Macêdo, Marcelo Andrade | - |
| dc.date.accessioned | 2026-07-14T20:39:17Z | - |
| dc.date.available | 2026-07-14T20:39:17Z | - |
| dc.date.issued | 2016 | - |
| dc.identifier.citation | MELO, A. H. N.; MACEDO, M. A. Permanent data storage in ZnO thin films by filamentary resistive switching. PloS One, San Francisco, v. 11, n. 12, 2016. Disponível em: https://journals.plos.org/plosone/article?id=10.1371/journal.pone.0168515. Acesso em: 14 jul. 2026. | pt_BR |
| dc.identifier.issn | 1932-6203 | - |
| dc.identifier.uri | https://ri.ufs.br/jspui/handle/riufs/25548 | - |
| dc.language | eng | pt_BR |
| dc.publisher | Public Library of Science | pt_BR |
| dc.relation.ispartof | PloS One | pt_BR |
| dc.subject | Resistive random access memories | eng |
| dc.subject | Nonrewritable resistive memories | eng |
| dc.subject | High resistance state | eng |
| dc.subject | ZnO thin films | eng |
| dc.title | Permanent data storage in ZnO thin films by filamentary resistive switching | pt_BR |
| dc.type | Artigo | pt_BR |
| dc.identifier.license | Creative Commons Atribuição 4.0 Internacional (CC BY 4.0) | pt_BR |
| dc.description.resumo | Resistive memories are considered the most promising candidates for the next generation of non-volatile memory; however, attention has so far been limited to rewritable memory features for applications in resistive random access memories (RRAM). In this article, we provide a new insight into the applicability of resistive memories. The characteristics of nonrewritable resistive memories (NRRM) were investigated. Devices with Pt/ZnO/ITO architecture were prepared using magnetron sputtering, upon which various bipolar and unipolar resistive switching tests were performed. The results showed excellent distinction between the high resistance state (HRS) and low resistance state (LRS), with RHRS/RLRS = 5.2 × 1011 for the Pt/ZnO/ITO device with deposition time of 1 h. All samples were stable for more than 104 s, indicating that the devices have excellent applicability in NRRMs. | pt_BR |
| dc.description.local | San Francisco | pt_BR |
| dc.identifier.doi | https://doi.org/10.1371/journal.pone.0168515 | - |
| Aparece nas coleções: | DFI - Artigos de periódicos | |
Arquivos associados a este item:
| Arquivo | Descrição | Tamanho | Formato | |
|---|---|---|---|---|
| PermanentDataStorageZnOThinFilms.pdf | 3,64 MB | Adobe PDF | ![]() Visualizar/Abrir |
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