Influência da temperatura de deposição nas propriedades mecânicas e tribológicas e na resistência à oxidação de filmes finos de Zr1-xSixN depositados por magnetron sputtering reativo

Abstract

Zirconium nitride (ZrN) and ternary Zr1-XSiXN thin films were deposited by reactive magnetron sputtering (RMS) with substrate heating at different temperatures in order to study the influence of the deposition temperature on the composition, mechanical and tribological properties and oxidation resistance. The ternary systems were produced with 1.6 at.% and 8.0 at.% of Si, as determined by Rutherford backscattering spectroscopy analysis (RBS). The depositions were carried out without external substrate heating (SA), at 300 °C, 500 °C and 700 °C. Characterizations of X-ray diffraction with grazing incidence X-ray diffraction (GIXRD), conventional scanning electron with field emission gun (SEM-FEG), nanoindentation tests, ball-on-flat linearly reciprocating sliding wear, scratch test and oxidation tests were used to detect possible changes in the structures and properties of the films. The results found were compared with the literature and showed that the increase in the deposition temperature promoted significant gains in the properties presented by the coatings, especially for those with the addition of 8 at.% Si. For this Si content, the process of recrystallization of the material was also observed when deposited with substrate heating, in comparison with the SA depositions that vi showed amorphous behavior. Indicative that there was an increase in the Si solubility limit in the ZrN matrix from the formation of a supersaturated solid solution in Si. In addition, it was possible to observe a greater resistance to oxidation for those coatings deposited at high temperatures.